|Authors: ||Lambert K., Moreels I., D. Van Thourhout, Hens Z.|
|Title: || Quantum dot micropatterning on si|
|Format: ||International Journal|
|Publication date: ||6/2008|
|Volume(Issue): ||24(11) p.5961-5966|
|Internal Reference: ||[N-733]|
Using InP and PbSe quantum dots, we demonstrate that the Langmuir-Blodgett technique is well-suited to coat nonflat surfaces with quantum dot monolayers. This allows deposition on silicon substrates covered by a developed patterned resist, which results in monolayer patterns with micrometer resolution. Atomic force microscopy and scanning electron microscopy reveal the formation of a densely packed monolayer that replicates predefined structures with high selectivity after photoresist removal. A large variety of shapes can be reproduced and, due to the excellent adhesion of the quantum dots to the substrate, the hybrid approach can be repeated on the same substrate. This final possibility leads to complex, large-area quantum dot monolayer structures with micrometer spatial resolution that may combine different types of quantum dots.
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