Photonics Research Group Home
Ghent University Journals/Proceedings
About People Research Publications Education
 IMEC
intern

 

Publication detail

Authors: Lambert K., Moreels I., D. Van Thourhout, Hens Z.
Title: Quantum dot micropatterning on si
Format: International Journal
Publication date: 6/2008
Journal/Conference/Book: LANGMUIR
Volume(Issue): 24(11) p.5961-5966
Internal Reference: [N-733]
Download: Download this Publication (163KB) (163KB)

Abstract

Using InP and PbSe quantum dots, we demonstrate that the Langmuir-Blodgett technique is well-suited to coat nonflat surfaces with quantum dot monolayers. This allows deposition on silicon substrates covered by a developed patterned resist, which results in monolayer patterns with micrometer resolution. Atomic force microscopy and scanning electron microscopy reveal the formation of a densely packed monolayer that replicates predefined structures with high selectivity after photoresist removal. A large variety of shapes can be reproduced and, due to the excellent adhesion of the quantum dots to the substrate, the hybrid approach can be repeated on the same substrate. This final possibility leads to complex, large-area quantum dot monolayer structures with micrometer spatial resolution that may combine different types of quantum dots.


Back to publication list