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Authors: W. Bogaerts, P. Bradt, L. Vanholme, P. Bienstman, R. Baets
Title: Closed-loop modeling of silicon nanophotonics from design to fabrication and back again
Format: International Journal
Publication date: 1/2009
Journal/Conference/Book: Optical and Quantum Electronics
Editor/Publisher: Springer Neherlands, 
Volume(Issue): 40(11) p.801-811
Internal Reference: [N-832]
DOI:
Download: Download this Publication (309KB) (309KB)

Abstract

We present a method for component-centric modeling of silicon nanophotonics, where a closed optimization loop allows to take the effects of the fabrication process into account during the design of nanophotonic components. This enables black-box component descriptions with functional parameters. Underlying mask layouts of the components can then automatically be optimized for their actual performance, and not just for their geometric layout. To simulate the effect of fabrication, we developed a projection lithography simulator which was included inside the optimization loop. This method was applied to the design of a 1-dimensional distributed Bragg mirror.

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