Authors:	M. Aamer, A. Gutierrez, A. Brimont, D. Vermeulen, G. Roelkens, J.M. Fedeli, A. Hakansson, P. Sanchis
Title:	A CMOS compatible SOI polarization rotator based on symmetry breaking of the waveguide cross section
Format:	International Journal
Publication date:	7/2012
Journal/Conference/Book:	Photonics Technology Letters
Volume(Issue):	p.2031-2034
DOI:	10.1109/lpt.2012.2218593
Citations:	63 (Dimensions.ai - last update: 17/11/2024) 31 (OpenCitations - last update: 10/5/2024) Look up on Google Scholar
Download:	(411KB)

Abstract

A polarization rotator in silicon-on-insulator
technology based on breaking the symmetry of the waveguide cross section is reported. The 25-ìm-long device is designed to be integrated with standard grating couplers without the need for extra fabrication steps. Hence, fabrication is carried out by a 2-etch-step complementary metal–oxide–semiconductor compatible process using 193-nm deep ultraviolet lithography. A polarization conversion efficiency of more than −0.85 dB with insertion losses ranging from −1 to −2.5 dB over a wavelength
range of 30 nm is demonstrated.