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Authors: W. Xie, Raquel Gomes, Tangi Aubert, S. Bisschop, Y. Zhu, Zeger Hens, Edouard Brainis, D. Van Thourhout
Title: Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots
Format: International Journal
Publication date: 10/2015
Journal/Conference/Book: Nano Lett.
Editor/Publisher: American Chemical Society, 
Volume(Issue): 15(11) p.7481–7487
Location: Washington, DC, United States
Internal Reference: [N-1800]
DOI:
Download: Download this Publication (3.8MB) (3.8MB)

Abstract

Using an optimized lift-off process we develop a technique for both nanoscale and single-dot
patterning of colloidal quantum dot films, demonstrating feature sizes down to ~30 nm for
uniform films and a yield of 40% for single-dot positioning, in good agreement with a newly
developed theoretical model. While first of all presenting a unique tool for studying physics of
single quantum dots, the process also provides a pathway towards practical quantum dot based
optoelectronic devices.

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