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Authors: W. Xie, R. Gomes, T. Aubert, S. Bisschop, Y. Zhu, Z. Hens, E. Brainis, D. Van Thourhout
Title: Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots
Format: International Journal
Publication date: 10/2015
Journal/Conference/Book: Nano Lett.
Editor/Publisher: American Chemical Society, 
Volume(Issue): 15(11) p.7481–7487
Location: Washington, DC, United States
DOI: 10.1021/acs.nanolett.5b03068
Citations: 31 (Dimensions.ai - last update: 17/10/2021)
17 (OpenCitations - last update: 19/4/2021)
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Abstract

Using an optimized lift-off process we develop a technique for both nanoscale and single-dot
patterning of colloidal quantum dot films, demonstrating feature sizes down to ~30 nm for
uniform films and a yield of 40% for single-dot positioning, in good agreement with a newly
developed theoretical model. While first of all presenting a unique tool for studying physics of
single quantum dots, the process also provides a pathway towards practical quantum dot based
optoelectronic devices.

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