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Publication detail

Authors: B. Haq, G. Roelkens
Title: Alignment-tolerant taper design for transfer printed III-V-on-Si devices
Format: International Conference Poster
Publication date: 4/2019
Journal/Conference/Book: European Conference on Integrated Optics (ECIO 2019)
Volume(Issue): p.T.Po2.1
Location: Ghent, Belgium
Citations: Look up on Google Scholar
Download: Download this Publication (442KB) (442KB)

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