| Authors: | K. Rajendran, Robin Petit, Christophe Detavernier , D. Van Thourhout | | Title: | Atomic Layer deposited nano-mechanical resonators for Silicon photonics | | Format: | International Conference Poster | | Publication date: | 1/2021 | | Journal/Conference/Book: | Frontiers of Nanomechanical Systems Workshop 2021
| | Volume(Issue): | p.poster 25 | | Location: | Barcelona (online), Spain | | Citations: | Look up on Google Scholar
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Abstract
Atomic layer deposition (ALD) is the high-precision conformal growth of a wide range of dielectrics thin films over a broad array of substrates. These ultra-thin (<10nm) ALD membranes possess very desirable mechanical properties such ultra-low mass and stiffness, for applications in nano-mechanical force and mass sensing. We determine the optical gradient force generated by the interaction of an alumina membrane suspended over a silicon waveguide mode using finite element methods (FEM). We have also developed an all dry fabrication method of suspending ALD alumina membranes using an e-beam resist (CSAR-62) as a sacrificial release layer.
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