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Since June 2004 the processing facilities of the Photonics Research Group are located in the new cleanroom built by Ghent University at the "Technology Centre Zwijnaerde", just outside of the center (see also: How to reach us). The cleanroom has a surface of approximately 1100 square meters, of which the Photonics Research Group can use approximately one third. The focus is on compound semiconductor based devices, both on InP and GaAs substrates. In addition, we work on the fabrication and assembly of micro-optical structures for optical interconnect applications.Below you’ll find a short overview of our most relevant equipment. For more details, information or processing requests contact or .

Standard equipment includes:

  • High resolution photolithography down to 0.6 um linewidth (Karl Suss MA6 & MJB3 maskaligners).
  • Plasma enhanced chemical vapour deposition of dielectric films (e.g. silicon dioxide, silicon nitride)
  • Evaporation and sputtering of metal contacts
  • Plasma etching and Reactive Ion Etching
  • Deposition of dielectric coatings (AR and HR)
  • Flip-chip device mounting
  • Wafer thinning and polishing

Advanced tools include:

  • A FEI Nova Nanolab 600 Dual-beam Focused Ion Beam / Electron Beam writer
    • EBSD (Electron Backscattering Diffraction)
    • EDS (Energy Dispersive Spectroscopy)
    • Raith lithography

    More information:

  • An inductively coupled plasma etch system for the fabrication of high-quality deeply etched waveguide structures.
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  • Holographic fabrication of grating structures
    • Both one and two dimensional grating structures
    • Using Argon laser
    • Grating period varying from 250 nm to 2 Ám
  • Measurement Microscope
  • Die-to-wafer bonding proces
    • Suitable for double sided processing (e.g. ring resonators) and for the heterogeneous integration of III-V semiconductor material and silicon circuits ( e.g. SOI research)
    • Using Benzocyclobuthene (BCB) as intermediate layer
  • Oxidation of AlGaAs films
    • For the fabrication of high-vertical contrast optical waveguides
    • For the fabrication of integrated beam-expanders (PhD Kurt de Mesel)
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  • SEM (JEOL) Jointly operated with the ELIS-department
  • Laser ablation system
    • For the structuring of a wide variety of materials
    • With excimer laser operating at either 193 nm or 248 nm
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All MOCVD activities were moved to IMEC Leuven during 2002. III-V substrates for the fabrication of optoelectronic devices are now obtained from other research groups or from commercial wafer fabs.

The photonics research group together with 6 other UGent research groups received a grant from the Flemish government for buying a dual beam FIB (focused ion beam). The FIB arrived in early spring 2005.

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