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Authors: P. Dumon, W. Bogaerts, D. Van Thourhout, D. Taillaert, V. Wiaux, S. Beckx, J. Wouters, R. Baets
Title: Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography
Format: International Conference Presentation
Publication date: 9/2004
Journal/Conference/Book: Group IV Photonics
Editor/Publisher: IEEE LEOS, 
Volume(Issue): p.WB5
Location: Kowloon, Hong Kong
DOI: 10.1109/group4.2004.1416642
Citations: 11 ( - last update: 14/7/2024)
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We demonstrate both ring resonator drop filters and arrayed waveguide gratings in Silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4dB/cm for a 500nm wide photonic wire, with excess bend losses of 0.03dB/90 degrees in a 3um bend. Using grating fiber couplers for measurements, we show ring and racetrack resonators with a Q up to 12700 and an 8-channel arrayed waveguide grating with a footprint of about 0.1mm2, 3nm channel spacing and -6dB crosstalk between channels.

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