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Authors: S. Selvaraja, P. Jaenen, S. Beckx, W. Bogaerts, P. Dumon, D. Van Thourhout, R. Baets
Title: Silicon nanophotonic wire structures fabricated by 193nm optical lithography
Format: International Conference Presentation
Publication date: 10/2007
Journal/Conference/Book: LEOS Annual Meeting 2007 (invited)
Location: Florida, United States
DOI: 10.1109/leos.2007.4382268
Citations: 7 (Web of Knowledge / Dimensions.ai - last update: 27/9/2020)
1 (OpenCitations - last update: 27/9/2020)
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Abstract

We demonstrate the use of 193nm optical lithography for fabricating nanophotonic wire structures on silicon-on-insulator (SOI) technology. We present fabrication and measurement result on wire devices. We report a propagation loss of 2.8dB/cm for 450X220nm photonic wire.

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