we report fabrication of photonic integrated circuit by CMOS process. Low loss deposited silicon-on-insulator was patterned using DUV optical lithography to form photonic circuit. Ring resonators were fabricated to qualify the fabrication process. Propagation loss of the deposited silicon was measured to be 3.5dB/cm at 1550nm. Ring resonators with Q values as high as 20,000 was demonstrated.
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