Photonics Research Group Home
Ghent University Journals/Proceedings
About People Research Publications Education Services
 IMEC
intern

 

Publication detail

Authors: S. Pathak, M. Vanslembrouck, P. Dumon, D. Van Thourhout, W. Bogaerts
Title: Effect of mask grid on SOI arrayed waveguide grating performance
Format: International Conference Proceedings
Publication date: 8/2013
Journal/Conference/Book: Group IV Photonics
Editor/Publisher: IEEE, 
Volume(Issue): p.WC7
Location: Seoul, South Korea
DOI: 10.1109/group4.2013.6644475
Citations: 3 (Web of Knowledge / Dimensions.ai - last update: 27/9/2020)
Look up on Google Scholar
Download: Download this Publication (1.2MB) (1.2MB)

Abstract

We studied the impact of the lithography mask grid
on the performance of silicon AWGs, and show a dramatic
improvement in crosstalk of 5dB when going from a 5nm to
a 1nm grid.

Related Research Topics


Back to publication list