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Authors: I. Abdo, Ch. Trompoukis, A. Abass, B. Maes, R. Guindi, V. Depauw, D. Van Gestel, I. Gordon, O. El Daif
Title: Combining Periodic Nanoimprint Lithography and Disorder for Light Trapping in Polycrystalline Silicon Solar Cells on Foreign Substrates
Format: International Conference Proceedings
Publication date: 10/2013
Journal/Conference/Book: European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC
Editor/Publisher: EUPVSEC, 
Volume(Issue): p.2626 - 2629
Location: Paris, France
Citations: Look up on Google Scholar
Download: Download this Publication (466KB) (466KB)


Experimental and theoretical investigations of two dimensional (2D) periodic photonic nanostructures fabricated by nanoimprint lithography (NIL) and dry etching on polycrystalline silicon (PolySi) layers are presented. PolySi layers are fabricated using the Aluminium induced crystallisation (AIC) layer exchange process and epitaxy. The optical properties of the nanopatterning and in particular its impact on absorption are studied. Nanoimprint lithography is performed on ultra-thin PolySi films grown on rough alumina substrates. The 2D periodic photonic nanostructures combined with the disordered substrate result in an enhanced light absorption in the photoactive material. The results are modelled thanks to an original model based on the finite element method combining coherent and incoherent simulations. The developed model shows that significant absorption enhancement can be achieved by combining front gratings and a back diffuser in a solar cell structure.

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