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Authors: K. Welna, K. Debnath, P. Dumon, A. Khanna, T.F. Krauss, L. O'Faolain
Title: High Q Photonic Crystal Cavities realised using Deep Ultraviolet Lithography
Format: International Conference Proceedings
Publication date: 8/2014
Journal/Conference/Book: Group IV Photonics
Volume(Issue): p.161-162
Location: Paris, France
DOI: 10.1109/group4.2014.6961997
Citations: 1 (Dimensions.ai - last update: 25/7/2021)
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Abstract

Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.


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