Authors:	W. Bogaerts, D. Taillaert, R. Baets, V. Wiaux, S. Beckx
Title:	Large-scale production techniques for photonic nanostructures using excimer laser replication
Format:	International Conference Proceedings
Publication date:	7/2002
Journal/Conference/Book:	Integrated Photonics Research (IPR) (invited)
Location:	Vancouver, Canada
DOI:	10.1364/ipr.2002.ifh4
Citations:	Look up on Google Scholar
Download:	(766KB)

Abstract

We demonstrate wavelength-scale photonic structures for photonic integrated circuits fabricated with 248nm-excimer laser deep UV lithography. Deep UV lithography combines mass-manufacturing capability with the resolution needed for photonic crystals or other submicron photonic structures.

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)

Related Projects

• IST: PICCO (Photonic Integrated Circuits using photonic Crystal Optics)
• IAP-V: PHOTON (Photons and Photonics : from basic physics to system concepts)