|Authors: ||W. Bogaerts, P. Dumon, J.-M. Fedeli, A. Tchelnokov, D. Van Thourhout, S. Selvaraja, R. Baets|
|Title: ||A Platform for Silicon-on-Insulator Nanophotonics on Industrial CMOS Tools|
|Format: ||International Conference Proceedings|
|Publication date: ||4/2007|
|Journal/Conference/Book: ||Photonic and Electromagnetic Crystal Structures (PCS-VII)
|Location: ||Monterey, United States|
|Citations: ||Look up on Google Scholar
Silicon nanophotonics has established itself as a promising technology to scale up photonic integrated circuits in functionality, integration, while reducing size and cost. However, the main requirement for a widespread application is the availability of a commercial manufacturing route. Leveraging the expertise and technology of CMOS electronics can provide a short-cut for the deployment of silicon nanophotonics.
Deep-UV fabricated photonic wires in Silicon-on-Insulator (SOI) have already been demonstrated to perform equally or better than their e-beam fabricated counterparts. Also, working photonic crystal devices have been demonstrated with this technology. Using lithography at 193nm instead of 248nm has already been
shown to improve device quality, with photonic crystal waveguides with acceptable propagation losses.
The Silicon Photonics Platform is a European initiative in the framework of the Network of Excellence ePIXnet. It allows research groups, projects and companies in silicon photonics research to use the wafer-scale fabrication processes
in the state-of-the-art CMOS technology fabs of IMEC and CEA-LETI for SOI nanophotonic waveguides. Already more than a dozen research groups worldwide have made use of these facilities in various collaborations.
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