Authors:	S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, R. Baets
Title:	Amorphous silicon photonic crystals made with 193nm lithography
Format:	International Conference Presentation
Publication date:	4/2009
Journal/Conference/Book:	The 8th International Photonic & Electromagnetic Crystal Structures Meeting (PECS)
Location:	Sydney, Australia
Citations:	Look up on Google Scholar
Download:	(86KB)

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)
• Deposited SOI technology for photonic application (2006-2012)

Related Projects

• IWT: epSOC (electro-photonic System-On-Chip)