Authors:	S. Selvaraja, Gayle Murdoch, Alexey Milenin , Christie Delvaux, Patrick Ong, S. Pathak, D. Vermeulen, Gunther Sterckx, Gustaf Winroth, Peter Verheyen, Guy Lepage, R. Baets, W. Bogaerts, J. Van Campenhout, Philippe Absil
Title:	Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors
Format:	International Conference Presentation
Publication date:	7/2012
Journal/Conference/Book:	17th OptoElectronics and Communications Conference (OECC 2012)
Editor/Publisher:	IEEE,
Volume(Issue):	p.PDP2-2 p15
Location:	Busan, South Korea
Citations:	Look up on Google Scholar
Download:	(241KB)

Abstract

We report on Si photonics devices fabricated on 300mm SOI substrates using 193-immersion lithography. Record low-loss of 0.7dB/cm with low phase-errors is obtained for 450-nm wide wire waveguides. We also demonstrate sub-wavelength grating fiber couplers with 42% coupling efficiency.