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Authors: S. Selvaraja, P. De Heyn, G. Winroth, P. Ong, G. Lepage, C. Cailler, A. Rigny, K. Bourdelle, W. Bogaerts, D. Van Thourhout, J. Van Campenhout, P. Absil
Title: Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
Format: International Conference Proceedings
Publication date: 3/2014
Journal/Conference/Book: Optical Fiber Communication Conference (OF2014)
Volume(Issue): p.Th2A.33
Location: San Francisco, United States
DOI: 10.1364/ofc.2014.th2a.33
Citations: 72 (Dimensions.ai - last update: 29/9/2024)
49 (OpenCitations - last update: 27/6/2024)
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Abstract

Using an advanced 300mm CMOS-platform, we report record-low and highly-uniform propagation loss: 0.45±0.12dB/cm for wires, and 2dB/cm for slot waveguides. For WDM devices, we demonstrate channel variation(3-ó) within-wafer and within-device of 6.1nm and 1.2nm respectively.

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