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Authors: J. De Witte, S. Cuyvers, S. Poelman, B. Kuyken, D. Van Thourhout
Title: Realization of Fabrication-Tolerant Si3N4-Si Mode Transformers
Format: International Conference Presentation
Publication date: 10/2021
Journal/Conference/Book: IEEE Photonics Conference (IPC)
Citations: Look up on Google Scholar

Abstract

Microtransfer printing can be used to fabricate a III-V/Si/SiN structure. This poses stringent requirements on the mode transformers. Rooted in coupled mode theory, we designed and fabricated 174 micrometer long robust Si tapers that are fabrication-tolerant and 750 nm misalignment-tolerant.

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