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Authors: K. Rajendran, Robin Petit, Christophe Detavernier , D. Van Thourhout
Title: Atomic Layer deposited nano-mechanical resonators for Silicon photonics
Format: International Conference Poster
Publication date: 1/2021
Journal/Conference/Book: Frontiers of Nanomechanical Systems Workshop 2021
Volume(Issue): p.poster 25
Location: Barcelona (online), Spain
Citations: Look up on Google Scholar

Abstract

Atomic layer deposition (ALD) is the high-precision conformal growth of a wide range of dielectrics thin films over a broad array of substrates. These ultra-thin (<10nm) ALD membranes possess very desirable mechanical properties such ultra-low mass and stiffness, for applications in nano-mechanical force and mass sensing. We determine the optical gradient force generated by the interaction of an alumina membrane suspended over a silicon waveguide mode using finite element methods (FEM). We have also developed an all dry fabrication method of suspending ALD alumina membranes using an e-beam resist (CSAR-62) as a sacrificial release layer.

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