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Authors: S. Cuyvers, T. Vanackere, T. Vandekerckhove, S. Poelman, C. Op de Beeck, J. De Witte, A. Hermans, K. Van Gasse, N. Picque, D. Van Thourhout, G. Roelkens, S. Clemmen, B. Kuyken
Title: High-Yield Heterogeneous Integration of Silicon and Lithium Niobate Thin Films
Format: International Conference Proceedings
Publication date: 5/2022
Journal/Conference/Book: Conference on Lasers and Electro-Optics
Location: United States
Citations: Look up on Google Scholar
Download: Download this Publication (240KB) (240KB)


Microtransfer printing of silicon and lithium niobate thin films on generic integrated photonic platforms is demonstrated. An unprecedented integration yield is achieved using crack barriers as a way to mitigate stress-induced shears in the material.

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