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back to project list H2020MedPhab

H2020: MedPhab

Full Name: Photonics Solutions at Pilot Scale for Accelerated Medical Device Development

Duration: 1/1/2020-30/9/2024

Partners:

1 VTT Technical Research Centre of Finland
2 University College Cork - Tyndall
3 JOANNEUM RESEARCH
4 Interuniversitair Micro-Elektronica Centrum IMEC
5 CSEM
6 Philips Electronics
7 Jabil Circuit Austria GmbH
8 Screentec OY
9 III-V Lab
10 Stryker Ireland Limited
11 Polar Electro OY
12 Radisens Diagnostics Limited
13 Antelope NV
14 GenSpeed Biotech GMBH
15 ViennaLab Diagnostics GMBH
16 Stichting Het Nederlands Kanker Instituut
17 European Photonics Industry Consortium EPIC
18 Amires s.r.o.

Objective:

MedPhab will serve as Europe's first Pilot Line dedicated to manufacturing, testing, validation and upscaling of new photonics technologies for medical diagnostics. MedPhab will bring the high-quality infrastructure and extensive know-how within easy reach of the SME's and other European Industry.

INTEC's Role:

Development of widely tunable laser (1500-1700nm), with III-V Lab
Development of SOI temperature sensor, with CSEM
Coordination of third party demo cases, with Amires and VTT

Project Web site: https://medphab.eu/

People involved

Research topics involved

Transfer printing technology

Publications in the framework of this project (9)

International Journals

H. Deng, J. Zhang, E. Soltanian, X. Chen, C. Pang, N. Vaissiere, D. Neel, J. Ramirez, J. Decobert, N. Singh, G. Torfs, G. Roelkens, W. Bogaerts, Single-Chip Silicon Photonic Processor for Analog Optical and Microwave Signals, Archived.(2023).
E. Soltanian, G. Muliuk, S. Uvin, D. Wang, G. Lepage, P. Verheyen, J. Van Campenhout, S. Ertl, J. Rimbock, N. Vaissiere, D. Neel, J. Ramirez, J. Decobert, B. Kuyken, J. Zhang, G. Roelkens, Micro-Transfer-Printed Narrow-Linewidth III-V-on-Si Double Laser Structure with Combined 110 nm Tuning Range, Optics Express, 30(22), p.39329-39339 doi:10.1364/OE.470497 (2022).

International Conferences

J. Zhang, L. Bogaert, M. Billet, D. Wang, B. Pan, S. Qin, E. Soltanian, S. Cuyvers, D. Maes, T. Vanackere, T. Vandekerckhove, S. Poelman, M. Kiewiet, I. Luntadila Lufungula, X. Guo, H. Li, J. De Witte, G. Lepage, P. Verheyen, J. Van Campenhout, B. Kuyken, G. Morthier, D. Van Thourhout, R. Baets, G. Roelkens, Photonic integrated circuits realized using micro-transfer printing, PIERS (invited), (2023).
H. Deng, E. Soltanian, J. Zhang, G. Roelkens, W. Bogaerts, Wavelength Converter using Micro Transfer-Printed Optical Amplifiers on a Full SiPh Platform, 2023 IEEE Silicon Photonics Conference (SiPhotonics), United States, doi:10.1109/SiPhotonics55903.2023.10141958 (2023) .
B. Pan, Jerome Bourderionnet, Vincent Billault, Arnaud Brignon, S. Dwivedi, Marcus Dahlem, Cian Cummins, Sandeep S. Saseendran, Nga Pham, Philippe Helin, Nicolas Vaissiere, Delphine Neel, Joan Ramirez, Jean Decobert, Johanna Rimbock, Ruggero Loi, Alin Fecioru, E. Soltanian, J. Zhang, B. Kuyken, G. Roelkens, III-V-on-silicon nitride narrow-linewidth tunable laser based on micro-transfer printing, Optical Fiber Communication Conference, Th3B.5, United States, p.paper Th3B.5 (3 pages) doi:10.1364/OFC.2023.Th3B.5 (2023) .
E. Soltanian, G. Muliuk, S. Uvin, D. Wang, G. Lepage, P. Verheyen, J. Van Campenhout, S. Ertl, J. Rimbock, N. Vaissiere, D. Neel, J. Ramirez, J. Decobert, B. Kuyken, J. Zhang, G. Roelkens, Narrow-Linewidth Micro-Transfer-Printed III-V-on-Si Laser with 110 nm Tuning Range, 2022 IEEE Photonics Society Summer Topicals Meeting Series (SUM) (invited), Mexico, p.paper TuG2.1-1 (2 pages) doi:10.1109/SUM53465.2022.9858218 (2022).
E. Soltanian, G. Muliuk, S. Uvin, D. Wang, G. Lepage, P. Verheyen, J. Van Campenhout, S. Ertl, J. Rimbock, N. Vaissiere, D. Neel, J. Ramirez, J. Zhang, G. Roelkens, Micro-Transfer-Printed III-V-on-Si Laser with 120nm tuning range, European Conference on Integrated Optics, 23, Italy, p.282-284 (2022) .
G. Muliuk, J. Zhang, G. Roelkens, Micro-Transfer-Printing Technology For Implementing Scalable III-V-on-Si Heterogeneous Integration , the 20th International Conference on Nanoimprint and Nanoprint Technologies (invited), Finland, (2021) .