| Authors: | E. Soltanian, G. Muliuk, S. Uvin, D. Wang, G. Lepage, P. Verheyen, J. Van Campenhout, S. Ertl, J. Rimbock, N. Vaissiere, D. Neel, J. Ramirez, J. Decobert, B. Kuyken, J. Zhang, G. Roelkens | | Title: | Narrow-Linewidth Micro-Transfer-Printed III-V-on-Si Laser with 110 nm Tuning Range | | Format: | International Conference Proceedings | | Publication date: | 7/2022 | | Journal/Conference/Book: | 2022 IEEE Photonics Society Summer Topicals Meeting Series (SUM)
(invited)
| | Editor/Publisher: | IEEE, | | Volume(Issue): | p.paper TuG2.1-1 (2 pages) | | Location: | Cabo San Lucas, Mexico | | DOI: | 10.1109/SUM53465.2022.9858218 | | Citations: | Look up on Google Scholar
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Abstract
On-chip laser sources covering a wide wavelength range is one of the key enablers to coherent optical communication systems. In this work, we demonstrate for the first time a narrow-linewidth III-V-on-Si laser with 110 nm tuning range realized using micro-transfer printing technology. Related Research Topics
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