Authors: | Yosuke Shimura, A. Srinivasan, D. Van Thourhout, Rik Van Deun, M. Pantouvaki, J. Van Campenhout, Roger Loo | Title: | Low temperature in-situ P-doped Ge epitaxy using Ge2H6 in view of optical applications | Format: | International Conference Proceedings | Publication date: | 5/2015 | Journal/Conference/Book: | The 9th International Conference On Silicon Epitaxy And Heterostructures
| Volume(Issue): | p.91-92 | Location: | Montreal, Canada | Citations: | Look up on Google Scholar
| Download: |
(1.5MB) |
Related Research Topics
|
|