Authors:	S. Cuyvers, T. Vanackere, T. Vandekerckhove, S. Poelman, C. Op de Beeck, J. De Witte, A. Hermans, K. Van Gasse, N. Picque, D. Van Thourhout, G. Roelkens, S. Clemmen, B. Kuyken
Title:	High-Yield Heterogeneous Integration of Silicon and Lithium Niobate Thin Films
Format:	International Conference Proceedings
Publication date:	5/2022
Journal/Conference/Book:	Conference on Lasers and Electro-Optics
Location:	United States
Online:	https://ieeexplore.ieee.org/abstract/document/9891466
Citations:	Look up on Google Scholar
Download:	(240KB)

Abstract

Microtransfer printing of silicon and lithium niobate thin films on generic integrated photonic platforms is demonstrated. An unprecedented integration yield is achieved using crack barriers as a way to mitigate stress-induced shears in the material.

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