Publication detail

Authors:	P. Dumon, W. Bogaerts, D. Van Thourhout, D. Taillaert, V. Wiaux, S. Beckx, J. Wouters, R. Baets
Title:	Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography
Format:	International Conference Presentation
Publication date:	9/2004
Journal/Conference/Book:	Group IV Photonics
Editor/Publisher:	IEEE LEOS,
Volume(Issue):	p.WB5
Location:	Kowloon, Hong Kong
Internal Reference:	[N-325]
Download:	(199KB)

Abstract

We demonstrate both ring resonator drop filters and arrayed waveguide gratings in Silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4dB/cm for a 500nm wide photonic wire, with excess bend losses of 0.03dB/90 degrees in a 3um bend. Using grating fiber couplers for measurements, we show ring and racetrack resonators with a Q up to 12700 and an 8-channel arrayed waveguide grating with a footprint of about 0.1mm2, 3nm channel spacing and -6dB crosstalk between channels.

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography
• Low-loss Nanophotonic waveguides
• WDM components

Related Projects

• IST: PICCO (Photonic Integrated Circuits using photonic Crystal Optics)
• IST: PICMOS (Photonic Interconnect Layer on CMOS by wafer-scale integration)
• IST: ePIXnet (European Network of Excellence on Photonic Integrated Components and Circuits)